Amorphous Si critical dimension structures with direct Si lattice calibration

论文摘要

Developing highly accurate critical dimension standards is a significant task for nanoscale metrology. In this paper, we put forward an alternative approach to fabricate amorphous Si critical dimension structures with direct Si lattice calibration in the same frame scanning transmission electron microscopy image. Based on the traceable measurement analysis, the optimized method can provide the same calibration accuracy and increase the fabrication throughput and lower the cost simultaneously, which benefits the application needs in atomic force microscopy(AFM) tip geometry characterization,benchmarking measurement tools, and conducting comparison measurements between different approaches.

论文目录

文章来源

类型: 期刊论文

作者: 吴子若,蔡燕妮,王星睿,张龙飞,邓晓,程鑫彬,李同保

来源: Chinese Physics B 2019年03期

年度: 2019

分类: 基础科学,工程科技Ⅰ辑

专业: 化学

单位: School of Physics Science and Engineering,Tongji University,School of Aerospace Engineering and Applied Mechanics,Tongji University

基金: supported by the National Key Scientific Instrument and Equipment Development Projects of China(Grant No.2014YQ090709),the National Key Research and Development Program of China(Grant No.2016YFA0200902),Major Projects of Science and Technology Commission of Shanghai,China(Grant No.17JC1400800)

分类号: O613.72;O76

页码: 130-134

总页数: 5

文件大小: 567K

下载量: 10

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