A physical model for simulating overlay metrology employing diffraction based overlay（DBO） principles is built. It can help to optimize the metrology wavelength selection in DBO. Simulation result of DBO metrology with a model based on the finite-difference time-domain（FDTD） method is presented. A common case（bottom mark asymmetry） in which error signals are always induced in DBO measurement due to the process imperfection were discussed. The overlay sensitivity of the DBO measurement across the visible illumination spectrum has been performed and compared. After adjusting the model parameters compatible with the actual measurement conditions, the metrology wavelengths which provide the accuracy and robustness of DBO measurement can be optimized.
类型: 期刊论文
作者: Buqing Xu,Qiang Wu,Lisong Dong,Yayi Wei
来源: Journal of Semiconductors 2019年12期
年度: 2019
分类: 信息科技,工程科技Ⅱ辑
专业: 工业通用技术及设备
单位: University of Chinese Academy of Sciences,Institute of Microelectronics, Chinese Academy of Sciences,Shanghai Integrated Circuit Research & Development Center
基金: supported by the National Science and Technology Major Project of China (Grant No. 2016ZX02301001)
分类号: TB9
页码: 127-132
总页数: 6
文件大小: 448K
下载量: 7
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